Photopolymerization Fundamentals 2009
June 21-24, 2009

Welcome to the Photopolymerization Fundamentals 2009 Website!

By bringing together academic and industrial leaders in the photopolymerization field, this meeting will attempt to address critical, fundamental questions related to photopolymerization.

PLEASE NOTE: There is still room for presentations in the Tuesday evening poster session.  Interested parties should contact Dr. Neil Cramer at neil.cramer@colorado.edu

Topics that will be discussed at the meeting include:
(but are by no means limited to)

• Microstructural Investigation of UV and EB-Cured Multiacrylates
• Selection of Monomers and Photo-processing Conditions to Control the Structure and Properties of Heterogeneous Polymers
• Photoinduced Conductive Polymer Nanoparticle Composite Formation
• UV Cure Water-based Polyurethane Dispersions - “unparalleled performance and ultra low VOC & VHAPS”
• Two-Color Single Photon Photoinitiation-Photoinhibition for Sub-Diffraction Photolithography
• Photoinitiators and Monomers for Medical Applications
• New Methods for Overcoming the Oxygen Inhibition in Free Radical Photopolymerization
• Photolatent Base Technology--A Versatile Tool Expanding Radiation Curing
• I-Line Sensitive Photoacid Generators for UV Curing
• Structure-Reactivity Relationships in the Cationic Photopolymerization of Epoxides
• New Intitating systems for Photoinduced Radical, Cationic and STep-Growth Polymerization
• Advanced Nanostructured Epoxy Coatings Obtained by Cationic UV Curing
• Structured Illumination for Reduction of Polymerization Shrinkage Stress in Photo-cured Acrylate Coatings
• The Role of the Photosensitizer in Three Component Radical Photopolymerization Systems
• Thiols, Enes, Ynes, Isocyanates and Thioisocyanates: Click to the Future and Beyond

Speakers that plan to attend and present include:

• Charles Hoyle, University of Southern Mississippi
• Christopher Bowman, University of Colorado
• Alec Scranton, University of Iowa
• Allen Guymon, University of Iowa
• Xavier Allonas, Université de Haute Alsace
• Robert Liska, Vienna University of Technology
• Masamitsu Shirai, Osaka Prefecture University
• Kevin Belfield, University of Central Florida
• Norbert Moszner, Ivoclar Vivadent AG
• Xavier Coqueret, Universite de Reims Champagne Ardenne
• Yusuf Yagci, Istanbul Technical University
• Michael Dvorchak, Bayer MaterialScience LLC
• Wayne Cook, Monash University
• Kristi Anseth, University of Colorado
• James Crivello, Rensselaer Polytechnic Institute
• Kurt Dietliker, Ciba
• Byron Christmas, University of Houston-Downtown
• Douglas Neckers, Bowling Green State University
• Marco Sangermano, Politecnico Di Torino

A unique format for talks will facilitate addressing of unanswered questions, leaving ample time for discussion and interaction between the speakers and the audience. The meeting will take place in beautiful Breckenridge, CO, and lots of opportunities will exist for taking advantage of the scenic location.

Highlights of the meeting include:

• Numerous scientific presentations on various photopolymerization topics
• An open atmosphere where presentation of difficult, unexplained results is encouraged
• A poster session open to all who would like to submit posters
• Reduced rates for students to promote interaction between industrial scientists and students
• A short course consisting of eight tutorial or review lectures from leaders in the photopolymerization community
• A fabulous location

I hope that you will choose to join us for this meeting, and I look forward to seeing you!

Christopher N. Bowman
Conference Chair Professor and Gillespie Faculty Fellow
Co-Director Photopolymerizations Center
Department of Chemical Engineering
University of Colorado

Sponored by:
RadTech--The Assocation for UV and EB Technology
Colorado Photopolymer Solutions--www.photopolymersolutions.com